Monday, June 5, 2017

Research Scientist ( Photolithography, Optical Proximity Correction | Fourier Optics | Optics ) (#115614)

Position: Research Scientist
Location: Milpitas, CA
Duration: Full time

Job Description:
Business Unit:
With over 40 years of semiconductor process control experience, chipmakers around the globe rely on KLA-Tencor to ensure that their fabs ramp next-generation devices to volume production quickly and cost-effectively. Enabling the movement towards advanced chip design, KLA-Tencor's Process Control Group is looking for the best and the brightest research scientist, software engineers, application development engineers, and senior product technology process engineers to join our 5D team.
 
Our 5D patterning process control technologies control the three dimensions of the device structure, while optimizing the process control loops (time) and minimizing the expense (cost) to create the device; hence five dimensional patterning process control (5D).
 
The team's mission is to collaborate with our customers to innovate hardware and software technologies that detect and control process variations—at their source—rather than compensate for them at later stages of the manufacturing process. These patterning process control solutions provide the most accurate process correctables available today; providing real-time feedback and feed-forward control to improve subsequent process steps.
 
Why join 5D? Think of this team as a "start-up" company where you are offered the ultimate challenge to solve the most complex technical problems that enable the digital age. Yet, this "start-up" is backed by the most sophisticated and successful process control company in the semiconductor industry.
 
Responsibilities:
KLA-Tencor has an opening for a research scientist in our Patterning Division working on Computational Patterning. Computational Patterning is the expansion of Computational Lithography to include leading-edge multi-patterning schemes, with a new emphasis on deposition and etch processes. This research position in Computational Patterning will have two focus areas.  First, the research scientist will work on a team to develop new models for patterning processing and to develop numerical algorithms to implement these models in the simulator PROLITH and similar platforms.  PROLITH currently has detailed models based on Fourier optics, Maxwell equations, chemical reaction-diffusion equations, and surface evolution. Further development in similar areas and appropriate numerical methods will be required.  Second, the researcher will work with customers to develop and to support new applications for computational patterning, working both on mask layout and fab use-cases.  Potential applications include rigorous OPC (optical proximity correction), weak point analysis, metrology target design, and evaluation of new patterning schemes.

Preferred Qualifications:
The candidate should have a strong background in applied mathematics and numerical methods, as well as familiar with standard programming languages such as C++ and numerical scripting in Matlab. The ideal candidate will be familiar with semiconductor processing, optics, and photolithography simulation. Candidate should be independent and self-motivated, but also able to work well on a team.
 
Minimum Qualifications:
Doctorate (Academic)
OR
Master's Level Degree with at least 2 years of experience.
OR
Bachelor's Level Degree with at least 3 years of experience.
Kindly send your resume to sivaram.bose@kla-tencor.com

KLA-Tencor is an Equal Opportunity Employer. Applicants will be considered for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, protected veteran status, disability, or any other characteristics protected by applicable law.